Extreme ultraviolet lithography ( EUVL) is one of the promising technologies for the fabrication of critical dimension of 100~ 32 nm. The optical performance of projection optics is most important to realize the fabrication of high resolution pattern. 极端紫外光刻(EUVL)作为实现100~32nm特征尺寸微细加工的优选技术,其光刻物镜的光学性能是实现高分辨图形制作的关键。
Studies on the Extreme Values of the Application of Two Dimension Dynamic Controlled Atmosphere ( TDCA) to the Storage of Starking Apple 红星苹果双相变动气调贮藏应用中的极值研究
Since it achieves higher productivity and better quality. As IC manufacturing needs extreme dimension and speed, challenge arises as how to realize repeated high-acceleration motion within very short period and precise micro displacement. 由于IC生产特点是需要极端的尺度和速度,这就给我们一个极大挑战:如何在很短的时间、精确的定位条件下实现可重复的高加速运动。